Nano Science and Technology Institute
Nanotech 2001 Vol. 1
Nanotech 2001 Vol. 1
Technical Proceedings of the 2001 International Conference on Modeling and Simulation of Microsystems
 
Chapter 9: Process Modeling
 

Semiempirical Direct Dynamics Trajectory Study of the Si+ (2P) + H2 -> SiH+ + H Reaction

Authors:N. Chaâbane, H. Vach and G.H. Peslherbe
Affilation:CNRS-Ecole Polytechnique, FR
Pages:434 - 437
Keywords:direct dynamics, trajectory study
Abstract:Silicon chemical vapor deposition (CVD) is widely used in the microelectronic industry for the production of integrated circuits. For the underlying chemical reactions, the dynamical properties of the involved Si-H compounds are of fundamental interest. I
Semiempirical Direct Dynamics Trajectory Study of the Si+ (2P) + H2 -> SiH+ + H ReactionView PDF of paper
ISBN:0-9708275-0-4
Pages:638
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