Semiempirical Direct Dynamics Trajectory Study of the Si+ (2P) + H2 -> SiH+ + H Reaction

	Nanotech 2001 Vol. 1 Technical Proceedings of the 2001 International Conference on Modeling and Simulation of Microsystems Chapter 9: Process Modeling
	Semiempirical Direct Dynamics Trajectory Study of the Si+ (2P) + H2 -> SiH+ + H Reaction
Authors:	N. Chaâbane, H. Vach and G.H. Peslherbe
Affilation:	CNRS-Ecole Polytechnique, FR
Pages:	434 - 437
Keywords:	direct dynamics, trajectory study
Abstract:	Silicon chemical vapor deposition (CVD) is widely used in the microelectronic industry for the production of integrated circuits. For the underlying chemical reactions, the dynamical properties of the involved Si-H compounds are of fundamental interest. I
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ISBN:	0-9708275-0-4
Pages:	638
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