Nanotech 2001 Vol. 1
Nanotech 2001 Vol. 1
Technical Proceedings of the 2001 International Conference on Modeling and Simulation of Microsystems

Process Modeling Chapter 9

Semiempirical Direct Dynamics Trajectory Study of the Si+ (2P) + H2 -> SiH+ + H Reaction

Authors: N. Chaâbane, H. Vach and G.H. Peslherbe

Affilation: CNRS-Ecole Polytechnique, France

Pages: 434 - 437

Keywords: direct dynamics, trajectory study

Abstract:
Silicon chemical vapor deposition (CVD) is widely used in the microelectronic industry for the production of integrated circuits. For the underlying chemical reactions, the dynamical properties of the involved Si-H compounds are of fundamental interest. I


ISBN: 0-9708275-0-4
Pages: 638

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