A Framework for Mask-Layout Synthesis Implementing a Level Set Method Simulator

	Nanotech 2001 Vol. 1 Technical Proceedings of the 2001 International Conference on Modeling and Simulation of Microsystems Chapter 9: Process Modeling
	A Framework for Mask-Layout Synthesis Implementing a Level Set Method Simulator
Authors:	C-Y. Lee and E.K. Antonsson
Affilation:	California Institute of Technology, US
Pages:	438 - 441
Keywords:	mask-layout synthesis, evolutionary algorithms, level sets
Abstract:	Recently, evolutionary methods have been developed to automate MEMS mask-layout synthesis [3]([6]. These design synthesis methods are iterative searches in which each iteration consists of mask-layout modification, determination of etched shape via an arbitrary 3-D etch simulator, and similarity evaluations between the etched shape and the desired shape, which is used to guide modification. The work described here differs from previous work in that a framework is developed for mask-layout synthesis that implements level set methods as the 3-D etch simulator.
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ISBN:	0-9708275-0-4
Pages:	638
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