Nano Science and Technology Institute
Nanotech 2001 Vol. 1
Nanotech 2001 Vol. 1
Technical Proceedings of the 2001 International Conference on Modeling and Simulation of Microsystems
 
Chapter 9: Process Modeling
 

A Framework for Mask-Layout Synthesis Implementing a Level Set Method Simulator

Authors:C-Y. Lee and E.K. Antonsson
Affilation:California Institute of Technology, US
Pages:438 - 441
Keywords:mask-layout synthesis, evolutionary algorithms, level sets
Abstract:Recently, evolutionary methods have been developed to automate MEMS mask-layout synthesis [3]([6]. These design synthesis methods are iterative searches in which each iteration consists of mask-layout modification, determination of etched shape via an arbitrary 3-D etch simulator, and similarity evaluations between the etched shape and the desired shape, which is used to guide modification. The work described here differs from previous work in that a framework is developed for mask-layout synthesis that implements level set methods as the 3-D etch simulator.
A Framework for Mask-Layout Synthesis Implementing a Level Set Method SimulatorView PDF of paper
ISBN:0-9708275-0-4
Pages:638
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