Nano Science and Technology Institute
Nanotech 2001 Vol. 1
Nanotech 2001 Vol. 1
Technical Proceedings of the 2001 International Conference on Modeling and Simulation of Microsystems
Chapter 5: Optimization

Statistical Optimal Design of Microelectromechanical Systems (MEMS)

Authors:H. Ren, A. Jog and R.B Fair
Affilation:Duke University, US
Pages:169 - 172
Keywords:microelectromechanical system (MEMS), statistical MEMS design, yield optimization, MEMS reliability, robust design, Taguchi method
Abstract:A three-step technique for MEMS quality optimization is demonstrated. It exploits the relative merits of its constituent optimization components. Analog Devices' ADXL50 accelerometer was the test device with microstructure dimen-sions serving as design parameters. Manufacturing design rules [7] and sensor performance requirements served as design constraints. A static model relating input acceleration to sensed voltage was used, neglecting sensor and signal con-ditioning dynamics. The trimming yield of the ADXL50, with sensitivity as the design target, was improved by 37%. We show that the three-step method enables the search for an optimal design in a semi-automatic manner by facilitating user interaction. Our final goal is to enable the generation of MEMS mask layout while ensuring robust designs with minimum sensitivity to fabrication process variations.
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