Nano Science and Technology Institute
Nanotech 2001 Vol. 1
Nanotech 2001 Vol. 1
Technical Proceedings of the 2001 International Conference on Modeling and Simulation of Microsystems
Chapter 5: Optimization

Robust Mask-Layout Synthesis for MEMS

Authors:L. Ma and E.K. Antonsson
Affilation:California Institute of Technology, US
Pages:128 - 131
Keywords:MEMS, synthesis, robust design, genetic algorithm
Abstract:A method for automated mask-layout and process synthesis for MEMS using Genetic Algorithms was proposed by Ma and Antonsson [5]. For a given desired device shape, and several fabrication process choices, this synthesis method will produce one or more mask-layouts and associated fabrication process sequences (which when used can generate shapes close to the desired one). This paper extended the previous work by integrating the robustness of the mask-layout relative to the fabrication variations into the evaluation criteria. By introducing expected variations into the fabrication simulation and making the robustness of the mask-layout part of the evaluation criteria, the stochastic optimization procedure will produce mask-layouts that are least sensitive to these variations, and robust design will be synthesized.
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