Nanotech 2001 Vol. 1
Nanotech 2001 Vol. 1
Technical Proceedings of the 2001 International Conference on Modeling and Simulation of Microsystems

Optimization Chapter 5

Robust Mask-Layout Synthesis for MEMS

Authors: L. Ma and E.K. Antonsson

Affilation: California Institute of Technology, United States

Pages: 128 - 131

Keywords: MEMS, synthesis, robust design, genetic algorithm

Abstract:
A method for automated mask-layout and process synthesis for MEMS using Genetic Algorithms was proposed by Ma and Antonsson [5]. For a given desired device shape, and several fabrication process choices, this synthesis method will produce one or more mask-layouts and associated fabrication process sequences (which when used can generate shapes close to the desired one). This paper extended the previous work by integrating the robustness of the mask-layout relative to the fabrication variations into the evaluation criteria. By introducing expected variations into the fabrication simulation and making the robustness of the mask-layout part of the evaluation criteria, the stochastic optimization procedure will produce mask-layouts that are least sensitive to these variations, and robust design will be synthesized.

Robust Mask-Layout Synthesis for MEMS

ISBN: 0-9708275-0-4
Pages: 638