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 | Nanotech 2001 Vol. 1
Technical Proceedings of the 2001 International Conference on Modeling and Simulation of Microsystems
Chapter 5: Optimization |
| | Robust Mask-Layout Synthesis for MEMS | | Authors: | L. Ma and E.K. Antonsson | | Affilation: | California Institute of Technology, U.S.A. | | Pages: | 128 - 131 | | Keywords: | MEMS, synthesis, robust design, genetic algorithm | | Abstract: | A method for automated mask-layout and process synthesis for MEMS using Genetic Algorithms was proposed by Ma and Antonsson [5]. For a given desired device shape, and several fabrication process choices, this synthesis method will produce one or more mask-layouts and associated fabrication process sequences (which when used can generate shapes close to the desired one). This paper extended the previous work by integrating the robustness of the mask-layout relative to the fabrication variations into the evaluation criteria. By introducing expected variations into the fabrication simulation and making the robustness of the mask-layout part of the evaluation criteria, the stochastic optimization procedure will produce mask-layouts that are least sensitive to these variations, and robust design will be synthesized. |  | View paper | | ISBN: | 0-9708275-0-4 |
| Pages: | 638 |
| Hardcopy: | $100.00 |
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