 | Nanotech 2001 Vol. 1
Technical Proceedings of the 2001 International Conference on Modeling and Simulation of Microsystems
Chapter 1: Plenary lectures |
Towards Predictive TCAD and Fab Integration | |
| Authors: | W. Fichtner |
| Affilation: | Swiss Federal Institute of Technology, CH |
| Pages: | 1 - 4 |
| Keywords: | technology CAD, predictive modeling, process simulation, device simulation, manufacturing CAD |
| Abstract: | This paper gives an overview of the status of technology computer-aided design (TCAD) as it is used today for research, development and manufacturing projects in the micro- and opto-electronics industry. While the accurate and physics-based simulation of process steps for ultra-scaled silicon technologies is still an area of active research, the simulation of electrical and optical effects has reached a high level of maturity for both Si and non-Si devices. |
 | View PDF of paper |
| ISBN: | 0-9708275-0-4 |
| Pages: | 638 |
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