Nanotech 2001 Vol. 1
Nanotech 2001 Vol. 1
Technical Proceedings of the 2001 International Conference on Modeling and Simulation of Microsystems

Plenary lectures Chapter 1

Towards Predictive TCAD and Fab Integration

Authors: W. Fichtner

Affilation: Swiss Federal Institute of Technology, Switzerland

Pages: 1 - 4

Keywords: technology CAD, predictive modeling, process simulation, device simulation, manufacturing CAD

Abstract:
This paper gives an overview of the status of technology computer-aided design (TCAD) as it is used today for research, development and manufacturing projects in the micro- and opto-electronics industry. While the accurate and physics-based simulation of process steps for ultra-scaled silicon technologies is still an area of active research, the simulation of electrical and optical effects has reached a high level of maturity for both Si and non-Si devices.

Towards Predictive TCAD and Fab Integration

ISBN: 0-9708275-0-4
Pages: 638