Nano Science and Technology Institute
Nanotech 2001 Vol. 1
Nanotech 2001 Vol. 1
Technical Proceedings of the 2001 International Conference on Modeling and Simulation of Microsystems
 
Chapter 1: Plenary lectures
 

Towards Predictive TCAD and Fab Integration

Authors:W. Fichtner
Affilation:Swiss Federal Institute of Technology, CH
Pages:1 - 4
Keywords:technology CAD, predictive modeling, process simulation, device simulation, manufacturing CAD
Abstract:This paper gives an overview of the status of technology computer-aided design (TCAD) as it is used today for research, development and manufacturing projects in the micro- and opto-electronics industry. While the accurate and physics-based simulation of process steps for ultra-scaled silicon technologies is still an area of active research, the simulation of electrical and optical effects has reached a high level of maturity for both Si and non-Si devices.
Towards Predictive TCAD and Fab IntegrationView PDF of paper
ISBN:0-9708275-0-4
Pages:638
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