Computational Materials

	MSM 2000 Technical Proceedings of the 2000 International Conference on Modeling and Simulation of Microsystems Chapter 3: Computational Materials
-	Ab initio Molecular Dynamics Simulations of Aluminum Ion Solvation in Water Clusters
	M.I. Lubin, E.J. Bylaska and J.H. Weare
	University of California, U.S.A.
-	Simulation of Porous Si and SiOx Layer Growth
	V.M. Burlakov, A.P. Sutton, G.A.D. Briggs and Y. Tsukahara
	University of Oxford, United Kingdom
-	Simulation Of Point Defect Clustering In Cz-Silicon Wafers On The Cray T3E Scalable Parallel Computer: Application To Oxygen Precipitation
	F.S. Karouri, A. Karoui and G.A. Rozgonyi
	North Carolina State University, U.S.A.
-	Heterogeneous Thin Films of Martensitic Materials with Application to Large Strain Microactuators
	Y.C. Shu
	California Institute of Technology, U.S.A.
-	Simulations for Optimized Piezoresistors
	D. Mladenovic and D. Vasileska
	Motorola, U.S.A.
-	Monte Carlo Simulation Study of Mechanical Properties of Au Nanowires
	S. Tanimori and S. Shimamura
	Yamaguchi University, Japan
-	Numerical Simulation of Periodical Distribution of Antisite Defects in Irradiated Semiconductors
	V.V. Mykhaylovskyy, K.C. Russell and V.I. Sugakov
	Academy of Science of Ukraine, Ukraine
-	Contribution of Hexagonal-like Structure to the Nonlinear Optics in SiC Nanocrystalites
	K.J. Plucinski, I.V. Kityk and A. Kassiba
	Miltary University of Technology, Poland
-	Computing Isomeric Higher and Smaller Fullerenes: Materials Controlled by a Profound Enthalpy/Entropy Interplay
	X. Zhao, Z. Slanina and E. Osawa
	Toyohashi University of Technology, Japan
-	Heterogeneous Thin Films of Martensitic Materials with Application to Large Strain Microactuators
	Y.C. Shu
	California Institute of Technology, U.S.A.
ISBN:	0-9666135-7-0
Pages:	741
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