MSM 2000
MSM 2000
Technical Proceedings of the 2000 International Conference on Modeling and Simulation of Microsystems

Process Modeling Chapter 2

Self-Adapting Vertices for Mask-Layout Synthesis

Authors: C-Y. Lee and E.K. Antonsson

Affilation: California Institute of Technology, United States

Pages: 83 - 86

Keywords: mask-layout synthesis, bulk etching, evolutionary algorithms

An efficient procedure for synthesizing MEMS mask-layouts for a desired 3-D shape is discussed. This method can greatly reduce the number of design and prototype iterations required to produce a desired device. The method is based on evolutionary algorithms, where the locations of vertices in the polygonal mask-layout are optimized, such that the resulting shape is `closest' to the desired shape [2], [3]. This work has been extended here to include varying the number of vertices in the mask-layout polygon(s), to free the designer from having to make an initial estimate at the complexity of the mask-layout required. Preliminary results are presented.

Self-Adapting Vertices for Mask-Layout Synthesis

ISBN: 0-9666135-7-0
Pages: 741