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 | MSM 2000
Technical Proceedings of the 2000 International Conference on Modeling and Simulation of Microsystems
Chapter 2: Process Modeling |
| | Self-Adapting Vertices for Mask-Layout Synthesis | | Authors: | C-Y. Lee and E.K. Antonsson | | Affilation: | California Institute of Technology, U.S.A. | | Pages: | 83 - 86 | | Keywords: | mask-layout synthesis, bulk etching, evolutionary algorithms | | Abstract: | An efficient procedure for synthesizing MEMS mask-layouts for a desired 3-D shape is discussed. This method can greatly reduce the number of design and prototype iterations required to produce a desired device. The method is based on evolutionary algorithms, where the locations of vertices in the polygonal mask-layout are optimized, such that the resulting shape is `closest' to the desired shape [2], [3]. This work has been extended here to include varying the number of vertices in the mask-layout polygon(s), to free the designer from having to make an initial estimate at the complexity of the mask-layout required. Preliminary results are presented. |  | View paper | | ISBN: | 0-9666135-7-0 |
| Pages: | 741 |
| Hardcopy: | $100.00 |
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