 | MSM 2000
Technical Proceedings of the 2000 International Conference on Modeling and Simulation of Microsystems
Chapter 2: Process Modeling |
Modeling of Focused Ion Beam Trimming of Cantilever Beams | |
| Authors: | T. Lam and R.B. Darling |
| Affilation: | Univeristy of Washington, US |
| Pages: | 79 - 82 |
| Keywords: | focused ion beam trimming, cantilever beams, finite element method |
| Abstract: | A finite element model of the cantilever beam is implemented to include a non-uniform thickness along its length, due to focused ion beam trimming. A quasi-static, iterative approach is used to calculate the cantilever profile for a given bias voltage. Two focused ion beam trimming strategies are compared. The snap-down voltage as a function of milling depth or width is calculated. |
 | View PDF of paper |
| ISBN: | 0-9666135-7-0 |
| Pages: | 741 |
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