Automated Mask-Layout and Process Synthesis for MEMS

	MSM 2000 Technical Proceedings of the 2000 International Conference on Modeling and Simulation of Microsystems Chapter 2: Process Modeling
	Automated Mask-Layout and Process Synthesis for MEMS
Authors:	L. Ma and E.K. Antonsson
Affilation:	California Institute of Technology, US
Pages:	20 - 23
Keywords:	MEMS, design, synthesis, genetic algorithm, bulk wet etching
Abstract:	This paper presents a method for automated mask-layout and process synthesis for MEMS. The synthesis problem is approached by use of a genetic algorithm. For a given desired device shape, and several fabrication process choices, this synthesis tool will produce one or more mask-layouts and associated fabrication process sequences (which when used can generate shapes close to the desired one). For complicated device shapes and wide range of fabrication process possibilities, it is hard for the designer to produce the right mask-layout and fabrication procedure by experience and trial and error. An automated synthesis tool like this will benefit the MEMS fabrication and synthesis by both eliminating the expense and time of the design and increasing the design accuracy.
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ISBN:	0-9666135-7-0
Pages:	741
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