Nano Science and Technology Institute
MSM 2000
MSM 2000
Technical Proceedings of the 2000 International Conference on Modeling and Simulation of Microsystems

Chapter 2:

Process Modeling

-Automated Mask-Layout and Process Synthesis for MEMS
 L. Ma and E.K. Antonsson
 California Institute of Technology, US
-Creation of 3D Surface Models from 2D Layouts for BEM Anaylysis
 M. Spasojevic, P. Ljung and M. Bächtold
 Coyote Systems, Inc., US
-Process Simulation for Contact Print Microlithography
 A.A. Darhuber, S.M. Miller, S.M. Troian and S. Wagner
 Princeton University, US
-Full-chip Process Simulation for Silicon DRC
 E. Sahouria, Y. Granik, N. Cobb and O. Toublan
 Mentor Graphics Corporation, US
-Systematic Design and Optimization of Multi-Material, Multi-Degree-of-Freedom Micro Actuators
 O. Sigmund
 Technical University of Denmark, DK
-Robust Ion-Implantation Process Design through Statistical Analysis
 C. Sudhama, R. Thoma, M. Morris, J. Christiansen and I-S. Lim
 Motorola Digital DNA Labs, US
-Modeling of Ultra-low Energy Ion Implantation by Monte-Carlo Method
 Y. Ban, S. Yoon, O. Kwon and T. Won
 Inha University, KR
-Two-Dimensional Simulation of Scanning Capacitance Microscopy Measurements of Arbitrary Doping Profiles
 L. Ciampolini, M. Ciappa, P. Malberti and W. Fichtner
 Swiss Federal Institute of Technology, CH
-Systematic Global Calibration of a Process Simulator
 J-H. Lee, K-D. Kim, J-T. Kong, S-W. Lee, Y-W. Kim and D-H. Baek
 Samsung Electronics Co.Ltd., KR
-Modeling of the Self-Limiting Oxidation for Nanofabrication of Si
 Y. Chen
 University of California, US
-On 2D/3D Numerical Oxidation Modeling: Calibration and Investigation of Silicon Crystal Orientation Effect on Stresses in Shallow Trench Isolations
 T. Hoffmann, K.F. Dombrowski and V. Senez
 IEMN-ISEN, UMR CNRS, FR
-Simulation of Orientation-Dependent Etching of Silicon Using a New Step Flow Model of 3D Structuring
 A. Horn, H. Schröder, E. Obermeier and G. Wachutka
 Munich University of Technology, DE
-Strength of Nanoscale Copper Connection Under Shear
 P. Heino
 Tampere University of Technology, FI
-Modeling the Microstructure and Elastic Properties of Complex Materials
 A.P. Roberts and E.J. Garboczi
 University of Queensland, AU
-Pre-Physical Design Analysis and Optimization of Repeaters Based on Technology Node, Materials, Devices, and Repeater Options
 W.T. Lynch
 Independent Consultant, US
-Modeling of Focused Ion Beam Trimming of Cantilever Beams
 T. Lam and R.B. Darling
 Univeristy of Washington, US
-Self-Adapting Vertices for Mask-Layout Synthesis
 C-Y. Lee and E.K. Antonsson
 California Institute of Technology, US
-Computer Simulation from Electron Beam Lithography to Optical Lithography
 Z. Cui
 Rutherford Appleton Laboratory, UK
ISBN:0-9666135-7-0
Pages:741
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