Nano Science and Technology Institute
MSM 2000
MSM 2000
Technical Proceedings of the 2000 International Conference on Modeling and Simulation of Microsystems
 
Chapter 17: Software Tools, CAD Systems
 

Wafer Fabrication Process Simulation Including Cost: Which Should be Used in an In-Line Wafer Inspection Strategy, High Sensitivity and High Cost Inspection Machine or Low Sensitivity and Low Cost Inspection Machine?

Authors:K. Nakamae, S. Yamaji and H. Fujioka
Affilation:Osaka University, JP
Pages:700 - 703
Keywords:wafer fabrication, inspection process, remedy, sampling inspection, particle
Abstract:By combing an event-driven simulation method including costs and a simple VLSI particle-induced yield predictor, we discuss that which should be used in an in-line wafer inspection strategy, a high sensitivity & high cost inspection machine or a low sensitivity & low cost inspection machine. Two segments of a DRAM fab line including the inspection and the defect sourcing stages are modeled. Simulated results show that setting an adequate wafer rejection condition and selecting a proper sampling plan obtain the minimum cost per chip regardless of the kind of inspection machine.
Wafer Fabrication Process Simulation Including Cost: Which Should be Used in an In-Line Wafer Inspection Strategy, High Sensitivity and High Cost Inspection Machine or Low Sensitivity and Low Cost Inspection Machine?View PDF of paper
ISBN:0-9666135-7-0
Pages:741
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