Authors: Y. Chen, Y. Shroff and W.G. Oldham
Affilation: University of California, United States
Pages: 602 - 604
Keywords: EUV maskless lithography, nanomirror, comb actuator, overshoot, settling time, Routh-Hurwitz criterion.
The design of mirrors for use in EUV maskless lithography is presented in this paper. We propose a novel nanomirror system with a linear comb actuator, which has favorable stability and performance. A bias voltage and resistor are provided to introduce electrical damping while a modulation voltage turns on/off the nanomirror. The issue of transient optimization to minimize the settling time and overshoot of time response is discussed. Two important control parameters are obtained which lead to specification of an optimal resistor and operating position.