Nano Science and Technology Institute
MSM 2000
MSM 2000
Technical Proceedings of the 2000 International Conference on Modeling and Simulation of Microsystems
 
Chapter 11: Numerics, Algorithms
 

A Mathematical Model for Process Control in Laser Chemical Vapor Deposition

Authors:R. Nassar, W. Dai, C. Zhang, H. Lan and J. Maxwell
Affilation:Louisiana Tech University, US
Pages:517 - 519
Keywords:chemical vapor deposition, mathematical model
Abstract:Laser chemical vapor deposition is a free form technique capable of producing high aspect ratio microstructures of arbitrary shape. The process does not yet have a high resolution required for microfabrication. For this study, we develop a mathematical model that can be used for predicting the scanning pattern of the laser beam on the surface of deposit in order to produce a microstructure with the desired geometry. We demonstrate the applicability of the model by simulating the deposition of a concave microlens using nickel on a graphite substrate.
A Mathematical Model for Process Control in Laser Chemical Vapor DepositionView PDF of paper
ISBN:0-9666135-7-0
Pages:741
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