MSM 2000
MSM 2000
Technical Proceedings of the 2000 International Conference on Modeling and Simulation of Microsystems

Numerics, Algorithms Chapter 11

A Mathematical Model for Process Control in Laser Chemical Vapor Deposition

Authors: R. Nassar, W. Dai, C. Zhang, H. Lan and J. Maxwell

Affilation: Louisiana Tech University, United States

Pages: 517 - 519

Keywords: chemical vapor deposition, mathematical model

Abstract:
Laser chemical vapor deposition is a free form technique capable of producing high aspect ratio microstructures of arbitrary shape. The process does not yet have a high resolution required for microfabrication. For this study, we develop a mathematical model that can be used for predicting the scanning pattern of the laser beam on the surface of deposit in order to produce a microstructure with the desired geometry. We demonstrate the applicability of the model by simulating the deposition of a concave microlens using nickel on a graphite substrate.


ISBN: 0-9666135-7-0
Pages: 741

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