 | MSM 2000
Technical Proceedings of the 2000 International Conference on Modeling and Simulation of Microsystems
Chapter 11: Numerics, Algorithms |
A Mathematical Model for Process Control in Laser Chemical Vapor Deposition | |
| Authors: | R. Nassar, W. Dai, C. Zhang, H. Lan and J. Maxwell |
| Affilation: | Louisiana Tech University, US |
| Pages: | 517 - 519 |
| Keywords: | chemical vapor deposition, mathematical model |
| Abstract: | Laser chemical vapor deposition is a free form technique capable of producing high aspect ratio microstructures of arbitrary shape. The process does not yet have a high resolution required for microfabrication. For this study, we develop a mathematical model that can be used for predicting the scanning pattern of the laser beam on the surface of deposit in order to produce a microstructure with the desired geometry. We demonstrate the applicability of the model by simulating the deposition of a concave microlens using nickel on a graphite substrate. |
 | View PDF of paper |
| ISBN: | 0-9666135-7-0 |
| Pages: | 741 |
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