Nano Science and Technology Institute - NSTI  
Nano Science and Technology Institute   Home | Subscribe | Site Map  
  ABOUT | COURSES | EVENTS | PUBLICATIONS | LEADERSHIP | OUTREACH | NEWS | PRESS | JOBS | Nanotechnology Solutions
px
px fade_top
Publications
Nanotech 2008 CDROM
Nanotech 2007 CDROM
Nanotech 2006 CDROM
Nanotech 2005 CDROM
Nanotech 2004 CDROM
3 CDROM Special Offer
Nanotech 2008 Vol. 1
Nanotech 2008 Vol. 2
Nanotech 2008 Vol. 3
Nanotech 2007 Vol. 1
Nanotech 2007 Vol. 2
Nanotech 2007 Vol. 3
Nanotech 2007 Vol. 4
Nanotech 2006 Vol. 1
Nanotech 2006 Vol. 2
Nanotech 2006 Vol. 3
Nanotech 2005 Vol. 1
Nanotech 2005 Vol. 2
Nanotech 2005 Vol. 3
WCM 2005
Nanotech 2004 Vol. 1
Nanotech 2004 Vol. 2
Nanotech 2004 Vol. 3
Nanotech 2003 Vol. 1
Nanotech 2003 Vol. 2
Nanotech 2003 Vol. 3
Nanotech 2002 Vol. 1
Nanotech 2002 Vol. 2
Nanotech 2001 Vol. 1
Nanotech 2001 Vol. 2
MSM 2000
MSM 99
MSM 98
Index of Authors
Index of Keywords
Index of Affiliations
Library Request Form
Shopping Cart
Order Form
 
Publications Publications
MSM 2000
p
 
Technical Proceedings of the 2000 International Conference on Modeling and Simulation of Microsystems
MSM 2000
Technical Proceedings of the 2000 International Conference on Modeling and Simulation of Microsystems
 
Chapter 1: Plenary lectures
 

Automatic Device Design Optimization with TCAD Frameworks

Authors:M. Stockinger and S. Selberherr
Affilation:Technical University of Vienna, Austria
Pages:1 - 6
Keywords:optimization, CMOS, TCAD, simulation, ultra-low-power
Abstract:A design optimization method is presented which utilizes automatic optimization capabilities within TCAD frameworks. This method is applied to doping profile optimizations of ultra-low-power CMOS transistors with 0.25 and 0.1 um gate lengths. Two different performance goals are utilized, to maximize the drive current of an NMOS transistor and to minimize the gate delay time of a CMOS inverter stage. These optimizations result in an asymmetric doping profile with a channel peak near the source. Gaussian functions are used to simplify the doping structure without much of a performance loss. The inverter speed of the 0.1 um technology is improved by almost 100% compared to an inverter with uniformly doped devices delivering the same off-state leakage current.
Automatic Device Design Optimization with TCAD FrameworksView paper
ISBN:0-9666135-7-0
Pages:741
Hardcopy:$100.00
Special:3 CD Set — 15% off with Free Shipping
Up
Upcoming Events
Nanotech 2009
Cleantech 2009
BioNano 2009
TechConnect Summit
nanoPRwire™
nanoPRwire
News Headlines
nano World news
 
 
 
 
px
© Nano Science and Technology Institute     About NSTI | Terms of Use | Privacy Policy | Contact