Fujitsu Partners With Advantest to Create Advanced Chip Prototypes Using Electron Beam Direct Lithography

Sep 29, 2006

NWN Learns More About The Deal’s Potential Market Impact From Mr. Yoji Hino, Senior Vice President at Fujitsu Limited.

Fujitsu Limited and Advantest Corporation announced their plans to establish a joint venture to create prototype semiconductors by using electron beam direct lithography. The advanced lithography technology will combine 65nm and 45nm semiconductor process technologies with electron beam exposure systems. “Using electron beam technology, Fujitsu will develop IP macros for 65nm/45nm technologies in an expedited manner and provide customers with prototype services at considerably low prices,” according to Mr. Yoji Hino, Senior Vice President, Electronic Devices Business Group, Fujitsu Limited. When asked about the potential market applications for these advanced seminconductors, Mr. Hino tells NWN, “Fujitsu is targeting Digital AV, Mobile, Automotive and Security market applications.”

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