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Optimization of Nano-Machining With Focused Ion Beams

Focussed Ion Beam Milled Line
FIB line milled at 52o incidence angle (DB stage tilt of 0o)
FIB milled lines can be optimized for nanomachining with an understanding of ion-solid interactions. In particular, the incident angle of the ion beam with respect to the sample surface as well as the direction of milling can affect the shape and aspect ratio of the FIB milled cut.

A DualBeam (DB) instrument consists of a focused ion beam (FIB) and scanning electron microscope (SEM) on the same platform. A 4k x 4k digital pattern generator can be utilized to automate precise movements of either the ion beam or the electron beam. FIB milling can be used for site-specific nano-machining of surfaces. In addition, by introducing a suitable precursor (e.g., organometallic gas) into the DB chamber, site specific metal lines can be produced via ion beam or electron beam assisted chemical vapor deposition processes. Many investigators have used DBs or FIB instruments to create nano-structures by either FIB milling or FIB/SEM deposition [1]. As will be shown below, the aspect ratio of a FIB milled line can be controlled by altering the incidence angle of the ion beam with respect to the sample surface through an understanding of ion-solid interactions.

Nanotech 2005 Conference Proceedings

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