Resolution Enhancement in Nanoimprinting by Surface Energy Engineering
Nanoimprinting lithography was initiated as an alternative way to achieve nanoscale structures with high throughput and low cost. We have developed a UVnanoimprint process to fabricate 34✗34 crossbar circuits with a half-pitch of 50 nm (equivalent to a bit density of 10 Gbit/cm2). Our resist was of a single layer, which required fewer processing steps than any bi-layer process, but yielded high quality results.
We devised a technique that exploits the opposite free energies of the mold and substrate surfaces to produce a very uniform resist film without any trap air. Sixty-six by sixty-six crossbar structures with a half-pitch of 30 nm were produced recently by improving the resist adhesion to the substrate with a surface linker.