Nano Science and Technology Institute

Resolution Enhancement in Nanoimprinting by Surface Energy Engineering

Nanoimprinting lithography was initiated as an alternative way to achieve nanoscale structures with high throughput and low cost. We have developed a UVnanoimprint process to fabricate 34✗34 crossbar circuits with a half-pitch of 50 nm (equivalent to a bit density of 10 Gbit/cm2). Our resist was of a single layer, which required fewer processing steps than any bi-layer process, but yielded high quality results.

We devised a technique that exploits the opposite free energies of the mold and substrate surfaces to produce a very uniform resist film without any trap air. Sixty-six by sixty-six crossbar structures with a half-pitch of 30 nm were produced recently by improving the resist adhesion to the substrate with a surface linker.

Nanotech 2005 Conference Proceedings

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