| Narayan R. Aluru | University of Illinois Urbana-Champaign, USA |
| Kazuo Asaumi | Fuji Research Institute Corporation, Japan |
| Xavier J. R. Avula | University of Missouri-Rolla, USA |
| Henry Baltes | Swiss Federal Institute of Technology of Zurich, Switzerland |
| Stephen Bart | Microcosm Technologies Inc. USA |
| Dirk Bussiere | Abbott Labs, USA |
| Constantin D. Bulucea | National Semiconductor, USA |
| Franco Cerrina | UW-Madison, Center for X-ray Lithography, USA |
| Avi K. Ray-Chaudhuri | Sandia National Laboratories, CA, USA |
| Selden Crary | University of Michigan, USA |
| Robert W. Dutton | Stanford University, USA |
| Roxann Engelstad | University of Wisconsin-Madison, USA |
| Gary K. Fedder | Carnegie Mellon University, USA |
| Toshio Fukuda | Nagoya University, Japan |
| Eberhard P. Hofer | University of Ulm, Germany |
| William Johnson | Motorola, USA |
| Jan G. Korvink | University of Freiburg, Germany |
| Mark E. Law | University of Florida, USA |
| Per Ljung | Coyote Systems, USA |
| Chris Menzel | Ford Microelectronics Inc., USA |
| Stephen J. Mumby | Molecular Simulations, Inc. |
| Michael G. Pecht | University of Maryland, USA |
| Philippe Renaud | Swiss Federal Institute of Technology of Lausanne, Switzerland |
| Marta Rencz | Technical University of Budapest, Hungary |
| Pierre Rossel | LAAS/CNRS, Toulouse, France |
| Stephen D. Senturia | Massachusetts Institute of Technology, USA |
| Armin Sulzmann | Swiss Federal Institute of Technology of Lausanne, Switzerland |
| Clayton Teague | National Institute of Standards and Technology, USA |
| Draciga Vasileska | Arizona State University, USA |
| Gerhard Wachutka | Technical University of Münich, Germany |
| Jacob White | Massachusetts Institute of Technology, USA |
| Thomas Wiegele | Motorola, USA |
| Sung-Kie Youn | Korea Advanced Institute of Science and Technology, Korea |
| Jay N. Zemel | University of Pennsylvania, Philadelphia, USA |
