NSTI Nanotech 2009

Castellated-Gate MOSFETs as Power Transistors for Nanometer CMOS and Post-CMOS Integrated Nanosystems

J.J. Seliskar
HiperSem Inc., US

Keywords: CMOS, Nanosystem, I/O, Interconnect, PHY Layer, Analog, Mixed-Signal

Abstract:

Analysis of the constant-voltage scaling characteristics of Fully-Depleted Castellated Gate (FDCG) MOSFETs reveals near term opportunities for these devices as the replacement for the “thick oxide” I/O device in CMOS System-On-A-Chip (SoC) technologies (e.g. the power transistor). Looking forward to the era of post-CMOS Integrated Nanosystems, FDCG MOSFETs utilized as PHY layer devices may provide the essential interoperable infrastructure for existing and yet-to-be-defined nanoscale devices.
 
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