NSTI Nanotech 2009

Patterning surfaces with functional polymers: a review of the state of the art - Overview

E. Kumacheva
University of Toronto, CA

Keywords: nanopattern, polymers, photolithography, self-assembly, printing techniques, top-down design, bottom-up design

Abstract:

The ability to pattern functional polymers at different length scales is important for research fields including cell biology, tissue engineering and medicinal science and the development of optical and electronic devices. The interest in polymer patterning have originated from the abundance of functionalities of polymers and a wide range of applications of polymer patterns. This talk reviews recent progress in top-down and bottom-up patterning of polymers using photolithography, printing techniques, self-assembly of block copolymers and instability-induced patterning. Challenges and future directions are discussed from the point of view of both applicability and strategies for the surface patterning of polymers.
 
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