NSTI Nanotech 2009

Analysis of density variation for different temperatures in thermal nano imprinting process

D-E Lee, H-J Lee, S-W Choi, W-I Lee
Seoul National University, KR

Keywords: nano imprint lithography, density variation, adhesion, atomic force microscope, molecular dynamics simulation

Abstract:

Density variation of the polymer resist for different temperatures in thermal nano imprinting1 process was studied by both experiments and molecular dynamics (MD) simulations. After patterning, we estimated the local density by measuring the pull-off force between a sharp tip and the patterned surface using an atomic force microscope (AFM) in liquid. In order to investigate the mechanism of density variation, we also performed molecular dynamics simulations.
 
Program | Tracks | Symposia | Workshops | Exhibitor | Press |
Venue | News | Subscribe | Contact | Site Map
© Copyright 2008 Nano Science and Technology Institute. All Rights Reserved.