NSTI Nanotech 2009

Advances in Dryfilm Photoresist for Microfluidic Device Applications

S. Weaver, M. Mathis, P. Dryer, E. Hall
Lexmark International, US

Keywords: dryfilm photoresist

Abstract:

A novel approach to form a 3 dimensional microfludic device is demonstrated by the use of a customized negative dryfilm photoresist. The formation of the microfludic chambers utilizes a lamination process, which enables the tenting of a negative photoresist onto the thickfilm barrier layer. Specifically, we will discuss the influences of the dryfilm photoresist components and how they relate to the imaging, thermo-mechanical and adhesive properties required to form a microfludic chamber.
 
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