NSTI Nanotech 2009

High-speed, Sub-15 nm Feature Size Thermochemical Nanolithography

D. Wang, R. Szoszkiewicz, T. Okada, S.C. Jones, V. Kodali, W.D. Underwood, J.E. Jarvholm, M. Rumi, W.P. King, J.E. Curtis, S.R. Marder, E. Riedo
Georgia Institute of Technology, US

Keywords: scanning probe microscopy, nanolithography, patterning

Abstract:

Nanolithography has been recognized as an essential component of future technologies. In particular, scanning probe microscopy (SPM) technologies have become increasingly popular due to their potential application in low-cost fabrication of nanoscale structures. However, many of the techniques employed today still have significant limitations in terms of resolution, speed of writing, and the chemical diversity of the materials that can be patterned on an arbitrary substrate. Recently, by using a resistively-heated atomic force microscopy tip, our team has demonstrated the ability to thermally activate a chemical reaction at the nanometer scale at the surface of a polymer material. Local chemical and topographical changes with feature sizes down to 12 nm at scan speeds up to 1 mm/s have been obtained with this new Thermochemical NanoLithography technique. This technique is very versatile and can be extended to a wide range of thermally activated chemical transformations. Furthermore, we have shown that it can be followed by functionalization or conversion of the surface chemistry obtained after the initial writing process and that an iterative application of these steps effectively increases the variety of chemical groups and macromolecules that can be independently patterned on the same surface.
 
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