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Micromachined Force Sensors for Characterization of Chemical Mechanical Polishing
D. Gauthier, A. Mueller, R. White, V. Manno, C. Rogers, S. Anjur, M. Moinpour
Tufts University, US
Keywords:
MEMS, force sensors, chemical mechanical polishing, CMP
Abstract:
Two types of microscale sensors are being developed to take in situ measurements of forces induced during chemical mechanical polishing. Flexible post sensors have been demonstrated, and floating element sensors are under development. Both sensors will be included in this presentation. Presenting Author: Douglas Gauthier
Nanotech 2008 Conference Program Abstract
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