2008 NSTI Nanotechnology Conference and Trade Show - Nanotech 2008 - 11th Annual

Partnering Events:

TechConnect Summit
Clean Technology 2008

New Approach for Successful HF Vapour Etching for MEMS release applications

A. Atherton, T. O’Hara, G. Pringle, M. Leavy
Senior Technologist, US

Keywords:
anhydrous, HF, release etch, sacrificial oxide

Abstract:
Novel new methods for the controlled vapor etching of dielectric films using anhydrous HF.


Nanotech 2008 Conference Program Abstract