2008 NSTI Nanotechnology Conference and Trade Show - Nanotech 2008 - 11th Annual

Partnering Events:

TechConnect Summit
Clean Technology 2008

Si-Based Process Aware SPICE Models for Statistical Circuit Analysis

S. Krishnamurthy, V.K. Dasarapu, Y. Mahotin, R. Ryles, F. Roger, S. Uppal, P. Mukherjee, A. Cuthbertson, X-W Lin
Synopsys Inc., US

Keywords:
statistical SPICE Models, process variability, design for manufacturability

Abstract:
This paper describes methodology for constructing compact SPICE models as a function of process parameter variations. The methodology involves global extraction of process-dependant SPICE model parametersfrom silicon data. The robustness of this methodology was tested by the quality of fits to the silicon devices and data for process conditions not used in the extraction. The analysis demonstrates an excellent goodness of fit over the full range of process parameter variations. The process-dependant SPICE models allow direct access to process parameter variations in circuit design. The extracted models are employed in rudimentary digital circuits to investigate the delay variation in response to process deviations. The proposed approach significantly improves design-for-manufacturing (DFM) by allowing for accurate design sensitivity analysis and parametric yield assessment, as a function of statistically independent and measurable process variations.


Nanotech 2008 Conference Program Abstract