Periodic Nanowell Array using Template-Assisted Nanosphere Lithography
S. Jung, J. Lee
Seoul National University, KR
template assisted nanosphere lithography, nanoimprint lithography
This paper presents a template-assisted nanosphere lithography(NSL) to obtain high-quality crystal in regularity and coverage(Figure 1). A periodic array of 100-nm deep, 360-450 nm wide nano-trenches was fabricated by nano imprint lithography(NIL), and used as the template. When polystyrene nanoshperes were spin coated on the substrate with the template morphology, they formed a crystal array with improved periodicity in lateral and longitudinal directions. We also demonstrate nanowell array through subsequent deposition and lift-off steps.
Nanotech 2008 Conference Program Abstract