2008 NSTI Nanotechnology Conference and Trade Show - Nanotech 2008 - 11th Annual

Partnering Events:

TechConnect Summit
Clean Technology 2008

New Method for large Area NIL - SCIL

J. van Eekelen, J. Weixlberger
Suss MicroTec Lithography, DE

Keywords:
NIL, large area imprint, non-UV based room temperature process

Abstract:
A new imprint technology for sub-50nm patterning will be introduced, bridging the gap between small rigid stamp application for best resolution and large area soft stamp usage with usual limited printing resolution below 200nm - SCIL Substrate Conformal Imprint Lithography is an enabling technology offering best of two worlds - large area soft stamps with repeatable sub-50nm printing capability, avoiding stamp deformation as no contact force applied, non-UV based curing at room temperature and allowing high aspect ratios even up to 1:10 The technology will be introduced, results for various applications be shown and measurement results confirming pattern fidelity and uniformity will be shown.


Nanotech 2008 Conference Program Abstract