We offer flexible, configurable process tools and leading-edge processes for the precise, controllable and repeatable etching, deposition and growth of micro- and nano-structures.
Our systems provide process solutions for the micro- and nanometre engineering of materials for semiconductor, optoelectronics, MEMS & microfluidics, high quality optical coating and many other applications in micro- and nanotechnology. These solutions are based on core technologies in:
- plasma-enhanced deposition and etch
- atomic layer deposition (ALD)
- molecular beam epitaxy (MBE)
- ion beam deposition and etch
Products range from compact stand-alone systems for R&D, through batch tools and up to clustered cassette-to-cassette platforms for high-throughput production processing.