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Nano Electronics & Photonics
Symposium Chair
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Keynote Speakers
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CMOS Process and Design Options for 32nm and beyond
Andreas Wild
Freescale Semiconductors Crolles Research Center, France
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Symposium Sessions |
| | Monday May 21 |
| 7:00 | Registration |
| 8:30 | Nanotech Conference Opening & Keynotes |
| 1:30 | NanoFab: Nano Photonics Devices & Fabrication |
| 4:20 | NanoFab: Nanofabrication Equipment, Imaging & Characterization |
| 4:00 | NanoFab: Nano-Wires: Fabrication and Applications |
| | Tuesday May 22 |
| 7:00 | TUESDAY - Registration |
| 11:00 | NanoFab: Bottom-Up Approach: Nano-Composites and Nano-Particles |
| 1:30 | NanoFab: Non-Conventional Nano-Patterning: Top Down/Bottom Up Convergence |
| 3:30 | NanoFab: Nanoscale Fabrication and Characterization - Sponsored by ASML |
| 3:50 | NanoFab: Nanoscale Fabrication and Characterization - Sponsored by ASML |
| 6:00 | IEEE-SA Nanotechnology Town HallMeeting |
| 4:00 | Poster Session 1 (4:00 - 6:00) & Expo Reception |
| | Wednesday May 23 |
| 8:30 | Keynotes: NanoFab: NanoElectronics |
| 11:00 | NanoFab: Advances in Nano-Lithography |
| 1:00 | Nanoscale Tools |
| 1:00 | NanoFab: Novel Materials and Nano-Structures Fabrication |
| 2:00 | Nanotech Poster Session 2 - Expo Reception (2:00 - 4:00) |
| 4:00 | NanoFab: Nano Electronics: Molecular and Nano Electronics |
| | Thursday May 24 |
| 8:30 | NanoFab Keynotes |
| 10:30 | NanoFab: Nanoscale Deposition and Patterning |
| 10:30 | NanoFab: Nano-Structure, Material and Applications |
| 1:30 | NanoFab: Nano-Devices Properties, Modeling and Fabrication |
| 1:30 | NanoFab: Nano-Material Surfaces and Thin Film Science & Technology |
| 4:00 | NanoFab: Bottom-Up Approach: Bio-Nano Device Fabrication |
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Symposium Program |
| | Monday May 21 |
| Back to Top |
| 7:00 |
Registration | Main Lobby |
| Back to Top |
| 8:30 |
Nanotech Conference Opening & Keynotes | Grand Ballroom |
| | Session chair: Bart Romanowicz, NSTI, Andreas Wild, Freescale Semiconductors |
| 8:30 |
How the US Can Ensure Energy Supply for the Future J. Hofmeister, Shell Oil, US (bio) |
| 9:10 |
National Nanotech Initiative and Industrial Nanotechnology Impact A.H. Carim, Co-Chair, Nanoscale Science and Engineering Technology, Subcommittee, National Science & Technology Council, U.S. Department of Energy, US (bio) |
| Back to Top |
| 1:30 |
NanoFab: Nano Photonics Devices & Fabrication | Great America 2 |
| | Session chair: Uma Krishnamoorthy, Sandia National Labs, US |
| 1:30 |
Fabrication Process of 3D-photonic crystals via UV-Nanoimprint Lithography T. Glinsner, P. Lindner, M. Mühlberger, I. Bergmair, R. Schöftner and K. Hingerl, EV Group, AT |
| 1:50 |
Engineering the Spectral Response of Waveguide Bragg Gratings Patterned by Deep Ultraviolet Nanolithography C.M. Greiner, D. Iazikov, T.W. Mossberg, A. Ticknor and B. McGinnis, LightSmyth Technologies, US |
| 2:10 |
Metal-Semiconductor-Metal Ultraviolet Detectors Utilizing Ge Nanocrystals Active Medium on Si Substrate S.Y. Lo, P.J. Wu, R.H Yeh and J.W. Hong, National Central University, TW |
| 2:30 |
Integrating 1D Nanostructures in Devices and Circuits for Massively Parallel and Manufacturable Nanoscale Electronics and Photonics M. Saif Islam, A. Choudhry and E. Fong, University of California- Davis, US |
| Back to Top |
| 4:20 |
NanoFab: Nanofabrication Equipment, Imaging & Characterization | Great America 2 |
| | Session chair: Andres H. La Rosa, Portland State University and Stanley Pau, University of Arizona |
| 4:20 |
Correlated roughness in polymer film containing magnetic nanoparticles M.M. Abul Kashem, J. Perlich, L. Schulz, S.V. Roth and P. Müller-Buschbaum, Technische Universität München, DE |
| 4:40 |
An All-Digital Cantilever Controller for MRFM and Scanned Probe Microscopy using a Combined DSP/FPGA Design D. de Roover, L.M. Porter II, A. Emami-Naeini, J.A. Marohn, S. Kuehn, S. Garner and D.D. Smith, SC Solutions, Inc., US |
| 5:00 |
Highly sensitive Scanning Capacitance Microscope H. Tanbakuchi, Agilent Technologies, US |
| 5:20 |
Confocal Raman AFM, a powerful tool for the nondestructive characterization of heterogeneous materials U. Schmidt, F. Vargas, M. Kress, T. Dieing, K. Weishaupt and O. Hollricher, WITec GmbH, DE |
| 5:40 |
Nano Equipment and Materials for Electronics - Market Needs and Outlook L. Sheet, SEMI, US |
| Back to Top |
| 4:00 |
NanoFab: Nano-Wires: Fabrication and Applications | Grand Ballroom F |
| | Session chair: Takamaro Kikkawa, Hiroshima University (Japan) and National Institute of Advanced Industrial Science and Technology (Japan) |
| 4:00 |
Horizontal and Vertical Heterogeneous Integration of Nanowires on Si Substrates L. Tsakalakos, S.T. Taylor, R.R. Corderman, J. Fronheiser and J. Balch, General Electric - Global Research Center, US |
| 4:20 |
One-dimensional Phase-Change Nanowires for Information Storage Application X.H. Sun and B. Yu, NASA Ames Research Center, US |
| 4:40 |
Transition Metal Oxide Core-Shell Nanowires: Synthesis and Electronic Properties C. Zhou, University of Southern California, US |
| 5:00 |
InSb and GaInSb nanowires for thermoelectric applications Q.L. Ye, R. Scheffler, J. Kumari and R. Leverenz, NASA Ames Research Center, US |
| 5:20 |
A unique opportunity for industrial scale fabrication of semiconductor nanowire-based devices B. Nikoobkht, National Institute of Standards and Technology, US |
| | Tuesday May 22 |
| Back to Top |
| 7:00 |
TUESDAY - Registration | Main Lobby |
| Back to Top |
| 11:00 |
NanoFab: Bottom-Up Approach: Nano-Composites and Nano-Particles | Grand Ballroom E |
| | Session chair: Takamaro Kikkawa, Hiroshima University (Japan) and National Institute of Advanced Industrial Science and Technology (Japan) |
| 11:00 |
Synthesizing agglomerate-free nanocomposites with surface-functionalized nanoparticles in a PMMA matrix. H. Dietsch and P. Schurtenberger, University of Fribourg, CH |
| 11:20 |
Fracture of Vacancy-defected Carbon Nanotubes and Their Embedded Composites S.P. Xiao and W.Y. Hou, The University of Iowa, US |
| 11:40 |
Noncovalent Catenation between Metal-Ligand Coordination Macrocycles and _-Cyclodextrin Y. Liu, Lawrence Berkeley National Laboratory, US |
| 12:00 |
Ultra-thin Nanocomposite Membranes for Highly Sensitive Sensors T.J. Kang, E.Y. Jang, J.H. Lee and Y.H. Kim, Seoul National University, KR |
| Back to Top |
| 1:30 |
NanoFab: Non-Conventional Nano-Patterning: Top Down/Bottom Up Convergence | Grand Ballroom E |
| | Session chair: Guy DeRose, California Institute of Technology, US |
| 1:30 |
Gas Phase Nanoparticle Integration C.R. Barry and H.O. Jacobs, University of Minnesota, US |
| 1:50 |
Template directed formation of nanostructures of biomolecules and inorganic nano-materials on silicon surface M. Liu and S.J. Rosner, Agilent Technologies, US |
| 2:10 |
A Nanoengineering Approach to Regulate the Lateral Heterogeneity of Binary Self-Assembled Monolayers J.J. Yu, X.Q. Tong and A. Ueki, Agilent Technologies, Inc., US |
| 2:30 |
Silicon Nanowire Transistors Fabricated by the Mass-Manufacturable, Self-Assembling “Grow-in-Place” Approach Y. Shan and S.J. Fonash, Pennsylvania State University, US |
| Back to Top |
| 3:30 |
NanoFab: Nanoscale Fabrication and Characterization - Sponsored by ASML | Grand Ballroom E |
| | Session chair: Norbert Kappel, ASML |
| 3:30 |
ASML Strategic Alliances for NanoTechnology R. van der Werf, ASML, NL |
| Back to Top |
| 3:50 |
NanoFab: Nanoscale Fabrication and Characterization - Sponsored by ASML | Grand Ballroom E |
| | Session chair: Norbert Kappel, ASML |
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B. Segal, Nantero, US |
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B. Bruggeman, SVTC, US |
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M. Tang, Stanford Nanofabrication Facility, US |
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J. Brown, SiTime, US |
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J. Consolini, ASML, US |
| Back to Top |
| 6:00 |
IEEE-SA Nanotechnology Town HallMeeting | Grand Ballroom E |
| Back to Top |
| 4:00 |
Poster Session 1 (4:00 - 6:00) & Expo Reception | Exhibit Hall |
| | Wednesday May 23 |
| Back to Top |
| 8:30 |
Keynotes: NanoFab: NanoElectronics | Grand Ballroom C |
| | Session chair: Uma Krishnamoorthy, Sandia National Labs and Leo Ocola, Argonne National Laboratory, US |
| 8:30 |
CMOS Process and Design Options for 32nm and beyond A. Wild, Freescale Semiconductors Crolles Research Center, FR (bio) |
| 9:15 |
Nanotechnology and Applications in III-V Materials and Devices I. Adesida, University of Illinois at Urbana-Champaign, US (bio) |
| Back to Top |
| 11:00 |
NanoFab: Advances in Nano-Lithography | Grand Ballroom C |
| | Session chair: Sang Hyun Oh, University of Minnesota, US |
| 11:00 |
Novel lithography technique using an ASML stepper/scanner for the manufacture of display devices in MEMS world K. Best, P. Raval, N. Kappel, C. Yang, M. Wang, N. Jeewakhan, M. Prejda, K. Kassekert and M. Moore, ASML USA, Inc - Special Applications, US |
| 11:20 |
High resolution Nanolithography using Focused Ion Beam Scanning Electron Microscopy (FIB SEM) O. Wilhelmi, L Roussel, D.J. Stokes and D.H.W. Hubert, FEI Company, NL |
| 11:40 |
Dip Pen Nanolithography®: A Maturing Technology for High-Throughput Flexible Nanopatterning J.R. Haaheim, E.R. Tevaarwerk, J. Fragala and R. Shile, NanoInk, Inc., US |
| 12:00 |
Fabrication of Bowtie Nano-Gap Structures by Electron Beam Lithography R. Murali, E. Walters, F. Zaman, C. Tabor, W. Huang, M. El-Sayed and J.D. Meindl, Georgia Tech, US |
| Back to Top |
| 1:00 |
Nanoscale Tools | Grand Ballroom G |
| | Session chair: John Tucker, Keithley Instruments |
| 1:00 |
Avoiding self-heating effects and measurement errors on nanoscale devices using Pulse I-V techniques J. Tucker, KeithleyInstruments, Inc., US |
| 1:20 |
Computer aided design of nano-scale technologies K. Stokbro, Atomistix, US |
| 1:40 |
Electronic and magnetic transport measurements with probe stations J. Lindemuth, Lake Shore Cryotronics, US |
| 2:00 |
Nanopositioners – An essential part of the nanotechnology toolkit J.F. MacKay, Mad City Labs, US |
| 2:20 |
Attributes of DPN® – compelling nanotechnology; Unique Advantages of NSCRIPTOR™ J. Haahein, Nanoink, US |
| Back to Top |
| 1:00 |
NanoFab: Novel Materials and Nano-Structures Fabrication | Grand Ballroom C |
| | Session chair: Guy DeRose, California Institute of Technology, US |
| 1:00 |
Responsive Hydrogels as Model Materials to Study the Deformation Behavior of Patterned Polymer Nanostructures V.R. Tirumala, C.M. Stafford, R. Huang, E.K. Lin and L.E. Ocola, National Institute of Standards and Technology, US |
| 1:20 |
Title: Nano/micro-structures formation driven by local protonation of polymer thin films via dip-pen nanolithography C. Maedler, S. Chada, A. La Rosa and M. Yan, Portland State University, US |
| 1:40 |
Bio-inorganic hybrids for nanoelectronics M. Ozkan, University of California - Riverside, US |
| 2:00 |
Single Crystalline InN Nanorods: Controlled Synthesis, Characterizations, and Applications O. Kryliouk, H.J. Park, J. Mangum, T. Anderson, A. Davydov, I. Levin and Z. Liliental-Weber, University of Florida, US |
| Back to Top |
| 2:00 |
Nanotech Poster Session 2 - Expo Reception (2:00 - 4:00) | Exhibit Hall |
| Back to Top |
| 4:00 |
NanoFab: Nano Electronics: Molecular and Nano Electronics | Grand Ballroom B |
| | Session chair: Mangat Pawitter, Motorola, US |
| 4:00 |
Nano-future: More Moore or More than Moore? A. Ionescu, EPFL, CH |
| 4:30 |
Hybrid Semiconductor/Nanoelectronic Circuit Architectures K.K. Likharev, Stony Brook University, US |
| 4:50 |
Three-terminal, single molecule circuits based on carbon nanotube interconnects B.R. Goldsmith, J.G. Coroneus, V.R. Khalap, A.A. Kane, G.A. Weiss and P.G. Collins, University of California, Irvine, US |
| 5:10 |
A Quasimolecular Approach to the Field-effect Molecular Transistor: Theory and Application Y.-L. Zhao, T. Allison, V. Mujica, C. Gonzalez and M. Marquez, NIST Center for Theoretical and Computational Nanosciences, US |
| 5:30 |
High Quality Nanogap Electrodes for Electronic Transport Measurements of Single Molecules D.E. Johnston, D.R. Strachan, B.S. Guiton, P.K. Davies, D.A. Bonnell and A.T. Johnson, University of Pennsylvania, US |
| | Thursday May 24 |
| Back to Top |
| 8:30 |
NanoFab Keynotes | Grand Ballroom H |
| | Session chair: Leo Ocola, Argonne National Laboratory |
| 8:30 |
MEMS Replaces the Quartz Crystal K. Petersen, Sitime Corporation, US (bio) |
| 9:15 |
Opportunities in Nanotechnology Measurement D. Solomon, Agilent, US (bio) |
| Back to Top |
| 10:30 |
NanoFab: Nanoscale Deposition and Patterning | Grand Ballroom H |
| | Session chair: Sang Hyun Oh, University of Minnesota and Stanley Pau, University of Arizona |
| 10:30 |
Electric Field Process for the Fabrication of Higher Order Structures form Biomolecule Derivatized Nanoparticles M.J. Heller, D. Dehlinger, B. Sullivan and S. Esener, University of California, San Diego, US |
| 10:50 |
Nanofabrication of Biomaterial, CNT and Organic Polymer Patterned Thinfilms using Piezoelectric Ink Jet Printing J.L. Sumerel, L.F. Deravi and D.W. Wright, Dimatix, Inc., US |
| 11:10 |
Direct Parallel Patterning of Multiplex DNA and protein arrays S. Rozhok, N. Amro, J. Fragala, T. Levesque and M. Nelson, NanoInk, Inc., US |
| 11:30 |
Thickness-controlled Metal Nanoscale Etch for Proposed Metal Nanowires Fabrication B.C. Lee, M.H. Kim, H.J. Shin and S. Moon, Korea Institute of Science and Technology, KR |
| Back to Top |
| 10:30 |
NanoFab: Nano-Structure, Material and Applications | Grand Ballroom B |
| | Session chair: Greg Bogart, Sandia National Labs and Leo Ocola, Argonne National Laboratory |
| 10:30 |
Electroluminescence from Surface Oxidized Silicon Nanoparticles Randomly Dispersed within a Polymer Matrix R.K. Ligman, L. Mangolini, U. Kortshagen and S.A. Campbell, University of Minnesota, US |
| 10:50 |
Electroluminescence of ZnO Nanowire/p-GaN Heterojunction Light Emitting Diodes X. Wang, J.J. Cole and H.O. Jacobs, University of Minnesota, US |
| 11:10 |
Monolayer to Multilayers Nanostructural Evolution in N type Oligothiphenes: Implications for OFET Performance G.R. Dholakia, A. Facchetti and T.J. Marks, ELORET / NASA Ames Research Center, US |
| 11:30 |
Parylene Nanospheres, Nanotubes & Nanocoatings for Medical and Electronics Applications R. Kumar and A. Greiner, Specialty Coating Systems, US |
| 11:50 |
Development of Nanostructures, Nanodevices, Nanocomposites, and Hierarchical Nanocomposites at Hawaii Nanotechnology Laboratory M. Ghasemi-Nejhad and A. Cao, University of Hawaii at Manoa, US |
| 12:10 |
Influence of Stress and Temperature on the Microstructure Stability of Nanocrystalline Materials R.K. Rajgarhia, S-W. Koh, D. Spearot, A. Saxena, P. Selvam and R. Tummala, University of Arkansas, Fayetteville, US |
| Back to Top |
| 1:30 |
NanoFab: Nano-Devices Properties, Modeling and Fabrication | Grand Ballroom H |
| | Session chair: Mangat Pawitter, Motorola and Leo Ocola, Argonne National Laboratory |
| 1:30 |
Grain Size Distribution in CoCrPtO-Based Perpendicular Magnetic Recording Media F. Hossein-Babaei, U. Kwon and R. Sinclair, Stanford University, US |
| 1:50 |
400-900 nm Light Emitting Silicon Nanoparticles R.W. Liptak, X.D. Pi, U. Kortshagen and S.A. Campbell, University of Minnesota, US |
| 2:10 |
Quantum Correction for the Current-Based One-Particle Monte-Carlo Method S.C. Brugger, A. Wirthmueller and A. Schenk, ETH Zürich, CH |
| 2:30 |
Single Election Trapping in Nanoscale Transistors; RTS(Random Telegraph Signals) and l/f Noise L. Forbes, D.A. Miller and M.Y. Louie, Oregon State University, US |
| Back to Top |
| 1:30 |
NanoFab: Nano-Material Surfaces and Thin Film Science & Technology | Grand Ballroom B |
| | Session chair: Greg Bogart, Sandia National Labs and Leo Ocola, Argonne National Laboratory |
| 1:30 |
Nanoscale hydrophobic coatings for the separation of liquid mixtures P. Truman, R. Frenzel, N. Longari, P. Uhlmann and M. Stamm, Institute of Polymer Research, DE |
| 1:50 |
The Si-tag for Immobilizing Proteins on a Silicon Device A. Kuroda, Hiroshima University, JP |
| 2:10 |
Low Temperature Nanolayers of Metal Oxides By MVD B. Kobrin, N. Dangaria and J. Chinn, Applied Microstructures, Inc, US |
| Back to Top |
| 4:00 |
NanoFab: Bottom-Up Approach: Bio-Nano Device Fabrication | Grand Ballroom H |
| | Session chair: Warren Lai, Alcatel-Lucent Bell Laboratories and New Jersey Nanotechnology Consortium, US |
| 3:30 |
From Particle Self-Assembly to the Creation of Biologically Relevant Nanopatterns T.M. Blättler, A. Binkert, E. Reimhult, M. Textor and J. Vörös, ETH Zurich, CH |
| 3:50 |
Manufacturable nanoscale membranes – material development and biological separations T.R. Gaborski, C.C. Striemer, J.L. Snyder, D.Z. Fang, P.M. Fauchet and J.L. McGrath, University of Rochester, US |
| 4:10 |
Nano-Patterned Surfaces Enhance Immunoreaction Efficiency A. Valsesia, I. Mannelli, P. Colpo, F. Bretagnol, G. Ceccone and F. Rossi, European Commision Joint researcc Center, IT |
| 4:30 |
Multifunctional Bio-Nano Patterns Derived from Colloidal Self-Assembly as Model Surfaces to Study Antigen-Antibody Interactions S. Krishnamoorthy, J.P. Wright, O. Worsfold, T. Fujii and M. Himmelhaus, Fujirebio, Inc., JP |
| 4:50 |
Micro-photonic cylindrical waveguide based protein biosensor S.K. Padigi, K. Asante, V.S. Reddy Kovvuri, R.K. Reddy, A. La Rosa and S. Prasad, Portland State University, US |
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Special Symposium
Scaling of semiconductor devices has continued unabated for the past three
decades, and will likely continue for the near future. However, at the end of
this decade (ca. 2011), the nature of the silicon device is such that many
alternative approaches are likely to be viable contenders.
Electronic, photonic and communication device opportunities are emerging, but
require coordinated industrial efforts to realize their potential. Already, new
materials (SOI, SiGe, strained Si) are used in current production, high-k
dielectrics, fully metallic gates and more non-(Si, SiO2) are expected in the
coming generations. In addition, low dimension structures such as Fin-FETS are
being considered.
Yet, the International Technology Roadmap for Semiconductors does not identify
logic devices beyond CMOS, which presents a unique opportunity for the research
community to influence the future of technology. Consequently, this symposium
will address the role of several prospective technologies in creating new device
options in the post-2011 era (sub-10 nm equivalent technologies). It will
provide a forum for the presentation of new designs, processes, devices,
architectures, and characterization at the nanoscale. Content will be mindful of
the rigors of the existing roadmaps and their associated infrastructure, but
will also explore extensions to the roadmap in alignment with industry, SIA and
governmental initiatives.
Topics & Application Areas
Online abstract submissions are now being accepted. Proposed topics
include, but are not be limited to:
- Si Based Nanoscale Devices
- Hybrid Organic/Inorganic Devices
- Quantum Wires and Transport
- Molecular Electronics
- Quantum Devices, Effects and Spintronics
- Nanoscale Device Modeling
- Nanoscale Process Modeling
- Nanoscale Electronic Material Modeling
- Inorganic Nano Wires
- Organic Nano Wires
- Self-Assembled Nanowires
- CNT Based Devices
- Nano Photonics
- Optoelectronics
- Memory Materials
- Nanoscale Memory Devices
- Interconnect Materials and Reliability
- Nanoscale Architectures
- Nanoscale Imaging and Instrumentation
- Next Generation Display Technologies
- Novel Materials
- Other
Also of Interest
session on photonic systems in the Nanoparticles in Soft
Materials - Colloidal Systems Symposium.
Journal Submissions
Journal of Experimental Nanoscience
Selected Nanotech Proceedings papers will be reviewed
and invited into a Special Issue of the Journal of Experimental Nanoscience.
The journal provides a showcase for advances in the experimental
sciences underlying nanotechnology and nanomaterials.
For consideration into this Special Issue of the Journal of
Experimental Nanoscience, please select the “Submit to Journal of
Experimental Nanoscience” button during the on-line submission
procedure. You may only select a single journal during the submission
process.
Molecular Simulation
Selected Nanotech Proceedings papers will be reviewed
and invited into a Special Issue of Molecular Simulation.
The journal covers all aspects of research related to, or of importance
to, molecular modelling and simulation (including informatics,
theoretical and experimental work).
For consideration into this Special Issue of Molecular Simulations,
please select the “Submit to Molecular Simulation” button during the
on-line submission procedure. You may only select a single journal
during the submission process.
Conference Quick Links
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