2007 NSTI Nanotechnology Conference and Trade Show - Nanotech 2007 - 10th Annual

Understanding and Utilizing Molecular Constraints in Nanoscale Material Designs

Scott Sills

Scott Sills

Micron Technology, Inc.

currently works towards next generation lithography developments at Micron Technology Inc. His background is built on a fundamental understanding how polymer dynamics are augmented under the influence of nanoscopic constraints, and how these constrained molecular behaviors are manifested in the form of material and transport properties relevant to nanotechnological applications. Scott received his PhD in Chemical Engineering at the University of Washington while working with Prof. René M. Overney to pioneer advancements in identifying the role of molecular cooperativity during structural relaxations in polymeric systems. Scott was twice awarded the international IBM Pre-Doctoral Fellowship for his contributions to their Terabit Millipede Storage Project, and he extended his post-doctoral research at IBM to consider the impact of nanoscopic molecular constraints on charge injection in organic electronic devices. Scott’s current research interests focus on utilizing nanoscale constraints to direct self-assembly processes in the production of “bottom-up” designed electronic devices.

Speaking in the special symposium on Nanoscale Characterization.


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