2007 NSTI Nanotechnology Conference and Trade Show - Nanotech 2007 - 10th Annual

Dip Pen Nanolithography®: A Maturing Technology for High-Throughput Flexible Nanopatterning

J.R. Haaheim, E.R. Tevaarwerk, J. Fragala and R. Shile
NanoInk, Inc., US

Keywords:
dip pen nanolithography, DPN, scanning probe lithography, SPL, scanning probe microscopy, SPM, AFM, nanoscale lithography, nanoscale deposition, direct deposition, nanofabrication

Abstract:
Precision nanoscale deposition is a fundamental requirement for much of current nanoscience research. Further, depositing a wide range of materials as nanoscale features onto diverse surfaces is a challenging requirement for nanoscale processing systems. As a high resolution scanning probe-based direct-write technology, Dip Pen Nanolithography® (DPN®) satisfies and exceeds these fundamental requirements. Herein we specifically describe the massive scalability of the process with two dimensional probe arrays. In collaboration with researchers at Northwestern University, we have demonstrated massively parallel nanoscale deposition with a 2D array of 55,000 pens on a centimeter square probe chip. This enables direct-writing flexible patterns with a variety of molecules, simultaneously generating 55,000 duplicates at the resolution of single-pen DPN. To date, there is no other way to accomplish this kind of patterning at this unprecedented resolution. The 2D nano PrintArray™ can cover a square centimeter with nanoscale features and pattern 10^7 m^2 per hour. Using established templating techniques, these advances enable screening for biological interactions at the level of a few molecules, or even single molecules.

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Nanotech 2007 Conference Program Abstract

 
 

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