2007 NSTI Nanotechnology Conference and Trade Show - Nanotech 2007 - 10th Annual

Growth and Engineering of High Aspect-Ratio AAO Templates Integrated on Silicon Substrates

S. Choi and M. Daugherty
Enable IPC Corporation, US

Keywords:
nanowire, silicon, alumina, nanopore, template, CMOS

Abstract:
We have developed a CMOS-compatible process for manufacturing nanowires directly on silicon (or other) substrates. This process removes some of the steps for conventional nanowire manufacture. The result are highly-ordered, high aspect-ratio nanowires for use in a variety of applications (we are concentrating on cathodes for rechargeable lithium ion batteries).

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Nanotech 2007 Conference Program Abstract

 
 

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