2007 NSTI Nanotechnology Conference and Trade Show - Nanotech 2007 - 10th Annual

Thickness-controlled Metal Nanoscale Etch for Proposed Metal Nanowires Fabrication

B.C. Lee, M.H. Kim, H.J. Shin and S. Moon
Korea Institute of Science and Technology, KR

Keywords:
nanowire, NEMS, nanoscale etch, MPOM, MPOL, electroless plating, selective etching

Abstract:
In this works, we developed a novel nanoscale etch process of metallic structures, the metal peel-off method(MPOM), to realize proposed fabrication of metal nanowires. Using this method, we simply and uniformly self-controlled etching rate of about 30nm/times through whole wafer level and we proposed a novel top-down fabrication process, the metal peel-off lithograph(MPOL), to pattern and form metal nanowires.

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Nanotech 2007 Conference Program Abstract

 
 

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