2007 NSTI Nanotechnology Conference and Trade Show - Nanotech 2007 - 10th Annual

Non-contact Nanolithography

R. Sailer, A. Lutfurakmanhov, I. Akhatov and D.L. Schulz
North Dakota State University, US

Keywords:
STM, nanodeposition, nanolithography

Abstract:
A new method of materials deposition based on scanning tunneling microscopy (STM) is presented. Non-contact Nanolithography (NCN) consists of a Au-coated glass nanocapillary tip integrated into a commercial STM scanner platform where the tip serves the dual purpose of imaging and deposition. The small diameter hollow fiber (O.D. < 500 nm) coupled with a conducting coating allows Angstrom-level z-resolution imaging using standard STM methodology. For film growth, the tip is first located within 10 nm of the substrate before the nanocapillary is pressurized with a fluid ink (P = 50-500 KPa) leading to the formation of a small meniscus that then interacts with the underlying surface to give small spot materials deposition. Initial results show the ability to form features less than 500 nm in diameter using 0.1% poly-3-hexylthiophene (P3HT) in toluene as the ink and highly-oriented pyrolytic graphite as the substrate. In addition to non-contact deposition, this technology also allows non-contact imaging using the constant height STM mode thereby eliminating the difficulties associated with finding nanometer-sized features. Additional benefits of this new technology will be discussed during this oral presentation.

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Nanotech 2007 Conference Program Abstract

 
 

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