Quantitative Synchrotron Grazing Incidence X-ray Scattering and Reflectivity Analysis of Nano-structures and Patterns Supported with Substrates
M. Ree, J. Yoon, K. Heo, K.S. Jin, S. Jin, B. Lee, I. Park, S.C. Choi, G. Kim, H. Kim, W. Oh, Y-H Park, Y. Hwang, J-S Kim, J. Kim, K-W Kim and T. Chang
Pohang University of Science & Technology, KR
nanostructures, nanopatterns, grazing incidence X-ray scattering, specular reflectivity
Single-layer, multi-layer, and patterned nanostructures were fabricated with aids of substrates from various material systems (polymers, diblock copolymers, polymer blends, alumina precursors, silane precursor, etc.) using wet spin-coating and subsequent dry and thermal process, chemical vapor deposition, and atomic layer deposition. These nanostructured sample specimens were investigated by means of synchrotron X-ray scattering, in particular grazing incidence X-ray scattering (GIXS), and specular X-ray reflectivity (SXR). This study successfully demonstrated that X-ray and neutron scattering and reflectivity techniques are very powerful to quantitatively characterize the structure and property details in nanostructure systems. These analyses provide all details in the structure and layer components, orientation, distortions, phase transformation, electron density and profiles, surface structure and roughness, and miscibility. All GIXS and SXR measurements were performed at the Pohang Accelerator Laboratory (PAL). All the results will be discussed with considering the chemical nature of materials, process conditions, and interfacial characteristics, as well as the resolution limit of the employed techniques.
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Nanotech 2007 Conference Program Abstract