2007 NSTI Nanotechnology Conference and Trade Show - Nanotech 2007 - 10th Annual

Prevention of Coalescence Stage from Nuclei at Initial Growth of Thin Film by Substrate Rotation in Physical Vapour Deposition

S-K Koh, J.H. Lee, Y.G. Han, J-S Cho, J.H. Joo and E.A. Kralkina
P&I Corp., KR

Keywords:
nano particles, nuclei formation, PVD, substrate rotation

Abstract:
A method of nanoparticle fabrication in physical vapor deposition was introduced. Metal were deposited on the powdery substrate which were stirred by rotors. Particle size and prodcuction rate of metal nano particles were controlled by types of substrate, rotation speed of the substrate and evaporation rate of the metal in order to form well distribute nano particles(1-10nm). Nucleation phenomena on the substrate is examined by SEM, TEM, XPS, UV spectra, conductivity measurment, etc. Current industrial applications, comparision with conventional methods, prodcution yield, etc. are discussed.

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