2007 NSTI Nanotechnology Conference and Trade Show - Nanotech 2007 - 10th Annual

3-D Electron Roughness Analyzing Microscope - an e-beam system developed for surface roughness analysis

G. Brake and Y. Uchiyama
SEMTech Solutions, Inc., US

Keywords:
surface Roughness, Topography, AFM

Abstract:
As research has now shifted to the nanometer scale there are new opportunities for roughness measurements pertaining to various manufactured devices that require ultra-smooth surfaces. The ability to quickly view, zoom, image and measure particular areas of interest with a large depth of focus, combined with moving stage and high lateral resolution, offers added benefits not realized with traditional metrology techniques such as AFM and optical profilometry. An Electron-beam Roughness Analyzing Microscope (e-RAM) has been designed to offer a one nanometer vertical resolution with the incorporation of 4 secondary electron detectors and a Thermal Field Emission (TFE) source. Correlation studies versus AFM on various samples have shown the e-RAM to offer excellent comparative results in the microroughness to submicroroughness range. An additional benefit of the e-RAM over AFM, besides the imaging and EDS capabilities like a traditional SEM, is that one can also measure waviness due to the much wider lateral range. The greatest advantage of the 3D e-RAM over ordinary SEMs is the 4 secondary electron detectors. This 4-channel SE detection system enables quantitative surface roughness measurements and enhances the topography by displaying the differential signal calculated from the 4 signals.

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Nanotech 2007 Conference Program Abstract

 
 

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