2007 NSTI Nanotechnology Conference and Trade Show - Nanotech 2007 - 10th Annual

Shadow Lithography for Nanoscale Patterning

K. Ritala
University of Washington, US

Keywords:
nanoscale lithography, Moore’s Law, nanowire, nanodots

Abstract:
Waferscale shadow lithography provides a method for forming nanoscale features as small as 1 nm on silicon wafers. It is free of the wavelength, physical contact and serial processing limitations of conventional lithographic techniques and can be used to create nanowells, nanochannels, nanowires or nanodots.

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Nanotech 2007 Conference Program Abstract

 
 

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