Analytical Methods for Nanotechnology
I.A. Mowat, J. Moskito, I Ward and A. Hartzell
Evans Analytical Group, US
surface, contamination, analysis, reliability
Growth in the fabrication of micro- and nano- engineered materials and systems has led to increased demand for analytical and characterization methods for these materials and systems. Many of the new manufacturing methods are extensions of established processes (e.g. MEMS manufacturing using traditional semiconductor processing). In contrast, some material growth methods do not have connections to prior technology, leading to challenges in the characterization, assessment and qualification of new materials. For example, nano-products with high surface area-to-volume ratios are more sensitive to impurities and microcontamination during processing than larger geometry products. New manufacturing methods, materials and processes generally have the same concerns that previously existed for advanced technologies (e.g. cleanliness, contamination, yield, reliability etc.) However, there are additional concerns regarding health and the environment, including nanoparticle exposure during manufacturing, shipment, and product use. This paper will demonstrate contributions that surface analysis can make towards problem solving during the manufacture and reliability characterization of new materials. These techniques include: SEM, AFM, XPS, SIMS, TOF-SIMS and Auger electron spectroscopy. Examples of these techniques as problem solving and characterization tools will be given, along with a discussion of their relative strengths and weaknesses with regards to sensitivity, information depth and analytical dimensions.
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Nanotech 2007 Conference Program Abstract