Nano and Molecular Electronics
Sunday May 7, 2006, 8:00 am - 6:00 pm, Boston, MA
Physics and Application of Nanoelectronic Devices
An overview of the physics and device application of nanoelectronic devices will
be presented. Topics will range from nanoscale silicon devices and their
theoretical limits, to nanostructured, low dimensional and single electron
devices, to molecular scale electronic transport physics.
Nanolithography and Nanoprocessing
In the fields of micro and nanolithography, major advancements in resolution
have historically been achieved through use of shorter wavelengths of light.
Along this path, such improvements come with an ever-increasing cost for
photolithographic tools. As conventional projection lithography reaches its
limits, Next Generation Lithography (NGL) tools using shorter wavelengths and
higher numerical apertures may provide a means to further pattern shrinks, but
are expected to have a price tag that is prohibitive for many companies.
Clearly, technologies that can reduce the tool cost by an order of magnitude
will have a significant effect on the economics of the fabrication process.
Imprint lithography is essentially a nanomolding process in which the topography
of a template defines the patterns created on a substrate. Investigations by
several researchers in the sub-50 nm regime indicate that imprint lithography
resolution is only limited by the resolution of the template fabrication
process. It possesses important advantages over photolithography and other NGL
techniques since it does not require expensive projection optics, or advanced
illumination sources that are central to photolithography and NGL technologies.
This tutorial will review the status and prospects of several NGLs, with an
emphasis on imprint lithography. Beam related patterning techniques including
electron beam lithography, x-ray lithography, deep ultra violet lithography, and
extreme ultraviolet lithography will be explored. Imprint lithography has many
variants, but can generally be broken into three sub-sections: Soft Lithography,
Nanoimprint Lithography, and Step and Flash Imprint Lithography. A derivative of
Nanoimprint Lithography, Step and Flash Imprint Lithography, or S-FIL, addresses
the issue of alignment by using a transparent fused silica template, thereby
facilitating the viewing of alignment marks on the template and wafer
simultaneously. The various aspects of the S-FIL process that are necessary for
a robust lithographic technology include the template, the tool, the resist, and
the pattern transfer. These topics, along with actual device applications will
be discussed. If time permits, additional lithographic technologies such as Dip
Pen Nanolithography and Molecular Transfer Lithography (MxL) will also be
Mark Reed is the Harold Hodgkinson Chair of Engineering and Applied
Science at Yale University, which he joined after co-founding the first U.S.
Nanoelectronics research program at Texas Instruments. His research activities
have included the investigation of nanoscale and mesoscopic systems, electronic
transport in heterojunction systems, artificially structured materials and
devices, MEMS and bioMEMS, nanotechnology, and molecular electronics. Mark is
the author of more than 150 professional publications, 5 books, has given ten
plenary and over 200 invited talks, and holds 23 U.S. and foreign patents. He
has been elected to the Connecticut Academy of Science and Engineering and Who's
Who in the World. His awards include; Fortune Magazine “Most Promising
Young Scientist” (1990), the Kilby Young Innovator Award (1994), the DARPA
ULTRA Most Significant Acheivement Award (1997), the Harold Hodgkinson Chair of
Engineering and Applied Science at Yale University (1999), the Syracuse
University Distinguished Alumni award (2000), the Forbes magazine
“E-Gang” (2001), the Fujitsu ISCS Quantum Device Award (2001), the
Yale Science and Engineering Association Award for Advancement of Basic and
Applied Science (2002), and in 2003 was elected a Fellow of the American
Doug Resnick received his Ph.D. in 1981 from the Ohio State University in
the field of Solid State Physics. Before joining Molecular Imprints, Doug worked
at Motorola Labs from 1990 till 2004. From 1981-1990, Doug worked at AT&T Bell
Laboratories. Development projects included x-ray lithography, GaAs direct write
and plasma etching of photomasks. Doug joined Motorola in 1990 and led the
development effort for x-ray mask pattern transfer. Doug was a Section Manager
in Motorola Labs, and a member of Motorola’s Scientific Advisory Board. Doug’s
previous assignment was to provide lithographic and plasma-processing solutions
for a diverse group of programs that are developing products in the Embedded
Systems and Physical Sciences Labs. Doug was responsible for developing
Motorola’s Step and Flash Imprint Lithography research program, and has authored
or co-authored over 100 technical publications and holds 16 U.S. patents. He has
served as the conference chair for both the EIPBN and SPIE Microlithography
|Before May 1
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Nanotech Impact Workshop Course Fee
Who Should Attend
These introductory - to intermediate - level courses are suitable for: Managers,
Practicing Engineers, Industrial Scientists, on a decision-making level,
Executives seeking strategic planning insight, Policy Makers with some technical
background, and Academic Researchers developing a strong nano program.
- Courses run Sunday May 7, 2006 from 8:00 am to 6:00 pm
- You may only attend a single course — please select it during registration
- Cancellations made by April 14, 2006 will be refunded less a $100.00 processing fee. Cancellations after April 14, 2006 are non-refundable.
- You may transfer your registration to another person at no charge prior to May 1, 2006. After May 1 no changes may be made.
- The running of all courses is dependent upon a minimum of 6 registrants.
- NSTI is not responsible to any instructor cancellations and subsequent changes in the program, but will make every effort to provide alternate content in the event of a cancellation.
- To register for a course, please follow the registration link.
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