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Flowability Modification of Fine Powders by Plasma Enhanced Chemical Vapor Deposition

A. Spillmann, A. Sonnenfeld and Ph. Rudolf von Rohr
Swiss Federal Institute of Technology (ETH), Institute of Process Engineering, CH

Keywords:
flowability of powders, plasma enhanced chemical vapor deposition, nanoparticles

Abstract:
Within the scope of this work a novel process to improve the flowability of fine powders is investigated. Nanoparticles are generated by plasma enhanced chemical vapor deposition (PECVD), and deposited on the surface of the substrate particles. These nanoparticles are acting as spacers between the substrate particles, thus increasing the distance between their surfaces and thereby decreasing the Van-der-Waal forces.
 
To investigate the nanoparticle generation and attachment in the PECVD process, glass beads as a model substrate were treated in a circulating fluidized bed reactor. The influences of varying process parameters like system pressure, gas composition and number of circulations on nanoparticle size distributions were investigated.

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