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Contamination Control for Ultra-Pure Water for the Emerging Applications in Immersion Lithography

B. Parekh
Entegris, US

Keywords:
liquid immersion lithography, ultra-pure water

Abstract:
Liquid immersion lithography is an emerging, enabling technology for extending the utility of 193 nm ArF excimer illumination beyond 65 nm technology node. Imaging with UPW between the lens element and the wafer is being used as a means of extending the optical lithography to 45 nm. Control of defects in immersion environment and haze during exposure is critical for high yields. No particles should be added to the wafer during the lithography process and the fluid must be free from bubbles. The immersion fluid might also remain on the wafer after exposure, and result in staining by dissolved materials or particles. This presentation addresses the water quality needs for the immersion process and presents key contaminant removal techniques and performance results. It also describes the design and development of point-of-use UPW (UltraPure Water) components and systems.

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