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Nanopatterning and conductivity studies of the polymer film using atomic force microscopy

S. Sindhu, R.C. Advincula and S. Valiyaveettil
National university of singapore, SG

Keywords:
nanopatterning, polymer, atomic force microscopy, electrostatic nanolithography

Abstract:
The importance of nanolithographic techniques in nanofabrication has attracted attention from researchers due to its potential application in downscaling device dimensions to the nanometer range. Fabrication of nanostructures from polymer films is of great interest in the development of areas, such as nanoscale electronics, sensor and data storage. However, exploring the patterning ability of various polymeric materials at different conditions is important to find the suitable materials for specific applications in polymer nanodevice fabrication. The focus of the current work would be on patterning PMAA (polymethacrylicacid) polymer surfaces with nanosized lines, dots and complex structures using electrostatic nanolithography and the kinetics of the formation of nanopattern on the polymer film was studied. Also, nanoscale current conduction in the polymer films is studied and the results will be discussed.

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