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Nanotool Fundamentals and Concepts:
observe and control matter at increasingly smaller scale

AFM, lithography, microscopy and related tools The advancement of nanotechnology depends to a large extend on microscopy and lithographic techniques which image and control matter at increasingly smaller scale. This course reviews some of the main microscopy and lithography tools used today in nanotechnology and discuss some of the changes of the underlining physical phenomena as the system dimensions shrink by several orders of magnitude.

Course Instructor

WSBacsa Wolfgang S. Bacsa Professor at the Solid State Physics Laboratory at the Université Paul Sabatier, France and visiting Research Professor at Boston University, USA. Dr. Wolfgang Bacsa is an expert in the emerging field of Nano-Optics and Carbon Nanotubes. He has a Ph.D. from the Swiss Federal Institute of Technology (ETH) Zürich in Physics and has extensive experience in condensed matter physics, optics, microscopy, synthesis of ultra-thin films and nanostructured carbon. Dr. Bacsa worked at ETH Zürich, Penn State University and EPFL Lausanne. He is currently a professor at the Solid State Physics Laboratory at the University of Toulouse in southern France and a visiting Research Professor at Boston University. His research interests are in interference scanning optical probe microscopy and carbon nanotubes. He has more than 15 years of research experience and published more than 60 scientific papers. He received an Innovation prize in 1998 and has been an invited visiting scientist at SRI Menlo Park CA and University of Osaka, Japan.

Who Should Attend

This course is designed for engineers who need to know about the different tools used in nanotechnology to use them effectively in combination with advanced synthesis techniques.

Topics

    microscopy using electron transmission, scanning probes and advanced dip-pen lithography and nanoimprinting
  • Electron transmission and scanning microscopy
  • Scanning probe microscopy (STM, AFM, NSOM)
  • Fundamentals of lithography, dip-pen nanolithography and nano imprinting
  • Current capabilities and physical limitations

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