Nano Science and Technology InstituteNano Science and Technology Institute
Nano Science and Technology Institute 2005 NSTI Nanotechnology Conference & Trade Show
Nanotech 2005
Bio Nano 2005
Business & Investment
Nano Impact Workshop
Program
Sessions
Sunday
Monday
Tuesday
Wednesday
Thursday
Index of Authors
Index of Keywords
Keynote Presentations
Confirmed Speakers
Participating Companies
Industry Focus Sessions
Nanotech Expo
Special Symposia
Conferences
Sponsors
Exhibitors
Venue 2005
Organization
Press Room
Subscribe
Site Map
 
Nanotech 2005 At A Glance
Nanotech Proceedings
Nanotechnology Proceedings
Global Partner
nano tech
Supporting Organizations
Nanotech 2005 Supporting Organization
Media Sponsors
Nanotech 2005 Medias Sponsors
Event Contact
696 San Ramon Valley Blvd., Ste. 423
Danville, CA 94526
Ph: (925) 353-5004
Fx: (925) 886-8461
E-mail:
 
 

Investigation of Patterned Media Concept for Very High Magnetic Storage Density

B. Horton and J.L. Streator
Georgia Institute of Technology, US

Keywords:
self-assembly, patterned media, magnetic recording, head flyability

Abstract:
One potential architecture for very high magnetic storage density, called perpendicular recording, orients the magnetic domains normal to the media surface to achieve a higher domain volume and therefore increase the thermal stability. Additionally patterned media separates the bit domains so that exchange coupling can be limited and improve thermal stability. This is different from the longitudinal, continuous storage media used in current production hard disk drives. With all the promise that patterned media holds, it is not known if current production slider heads can generate sufficient pressure fields to limit head to disk contact, or achieve full hydrodynamic lubrication (known as ‘flying’ over media). Therefore, the focus of this work is to characterize the flyability of current production slider heads over patterned media through experiments. Extremely dense samples, corresponding to 700 Gbit/in2, are created via nanometer scale self assembled thin film lithography with wet chemical etching. Experiments were carried out to characterize normal load, tangential load, interface contact, fly height, and rotation rate, respectively. It is demonstrated that loss of hydrodynamic lubrication is small for small pattern regions with high conserved surface area ratio. Thus the viability of the process looks promising for magnetic recording applications.

Back to Program

Sessions Sunday Monday Tuesday Wednesday Thursday Authors

Nanotech 2005 Conference Program Abstract

 
Gold Sponsors
Nanotech Gold Sponsors
Silver Sponsors
Nanotech Silver Sponsors
Gold Key Sponsors
Nanotech Gold Key Sponsors
Nanotech Ventures Sponsors
Nanotech Ventures Sponsors
Sponsors
Nanotech Sponsors
News Headlines
NSTI Online Community
 
 

© Nano Science and Technology Institute, all rights reserved.
Terms of use | Privacy policy | Contact