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Simulation Studies of Plasmon Enhanced Evanescent Near-Field Optical Lithography

B. Sefa-Ntiri, P. Docker, M.C. Ward and P.D. Prewett
University of Birmingham, UK

Keywords:
ENFOL, nano lithography

Abstract:
Evanescent Near-Field Optical Lithography (ENFOL) is an inexpensive route to nanolithography, overcoming the diffraction limitations of conventional optical technology. This paper details modelling work developed by the authors, to produce a predictive model that can be used by future workers wishing to use ENFOL. This work was carried out using the commercial package FEMLABTM. The model provides a tool for developing prototype low-cost, flexible and high-performance optical lithographic masks for the fabrication of diffraction-limited high resolution features, in a “virtual testing” capability. Techniques such as ENFOL are becoming particularly attractive as the need for the miniaturization of devices and therefore the increased density of devices that will fit on a single wafer continues to grow. Where high density lowers packaging costs, which are a significant factor in the cost of photonic and optoelectronic products, for example.

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