Regular Nano-Pores Fabricated By UV Cross-Linking Non-softbaked SU-8 Resist In a Solvent Evaporation Controlled Environment
C-J Chang, F-G Tseng and C-S Yang
National Tsing Hua University, TW
nanopores, SU-8, UV-crosslinking
This paper proposes a novel technology to fabricate 3D nano pore structures in SU-8 resist, a widely employed resist in MEMS and Bio-chips. Controlling the evaporation rate in SU-8 fabrication process, regular porous structures with pore size close to tens nm can be obtained. Fluorescent dye and glucose has been tested passing through this porous material while not through standard processed SU-8 resist film. This simple process provides a novel way to fabricate patternable molecular filter with SU-8 resist of regular nano sized pores.
Back to Program
Nanotech 2005 Conference Program Abstract