Nano Science and Technology InstituteNano Science and Technology Institute
Nano Science and Technology Institute 2005 NSTI Nanotechnology Conference & Trade Show
Nanotech 2005
Bio Nano 2005
Business & Investment
Nano Impact Workshop
Program
Sessions
Sunday
Monday
Tuesday
Wednesday
Thursday
Index of Authors
Index of Keywords
Keynote Presentations
Confirmed Speakers
Participating Companies
Industry Focus Sessions
Nanotech Expo
Special Symposia
Conferences
Sponsors
Exhibitors
Venue 2005
Organization
Press Room
Subscribe
Site Map
 
Nanotech 2005 At A Glance
Nanotech Proceedings
Nanotechnology Proceedings
Global Partner
nano tech
Supporting Organizations
Nanotech 2005 Supporting Organization
Media Sponsors
Nanotech 2005 Medias Sponsors
Event Contact
696 San Ramon Valley Blvd., Ste. 423
Danville, CA 94526
Ph: (925) 353-5004
Fx: (925) 886-8461
E-mail:
 
 

Nano-Crystalline Ta2O5 Films Deposited by DC Pulsed Magnetron Sputtering

V. Ligatchev, E. Rusli, L-B Keng, L-F Khuen, Y. Rumin and J. Zhao
Nanyang Technological University, SG

Keywords:
tantalum pentaoxide, nano-morphology, optical properties

Abstract:
Thin Ta2O5 layers (95 - 110 nm), deposited at room temperature using pulsed DC magnetron sputtering (PDCMS) in an argon-oxygen (Ar-O2) gas mixture, are investigated. The Ta2O5 samples were prepared at different Ar/O2 flow ratios (0.3 – 1.0), and then post-annealed in an oxygen ambient at 350, 600, and 900 0C. The XRD data clearly demonstrates the presence of a nanocrystalline phase in all the samples, including those that were as-deposited. The average size of the nano-crystals was estimated to range from 1.1 to 2.3 nm for the as-deposited samples and those annealed at 350 and 600 0C. For the films annealed at 900 0C, the average crystalline size varies from 10 to 16 nm. Nano-scaled morphology observed by AFM technique on the surfaces of all the Ta2O5 films studied. The samples annealed at 900 0C reveal nano-crystals with sizes of 5-15 nm, consistent with the results deduced from the XRD data. The Tauc bandgap, EG, varies across a relatively small range (4.30 – 4.53 eV) for the as-deposited samples and those annealed below 600 0C. However, it drops sharply to 3.6 eV for the films annealed at 900 0C. Such variation in EG are attributed to the quantum confinement effect.

Back to Program

Sessions Sunday Monday Tuesday Wednesday Thursday Authors

Nanotech 2005 Conference Program Abstract

 
Gold Sponsors
Nanotech Gold Sponsors
Silver Sponsors
Nanotech Silver Sponsors
Gold Key Sponsors
Nanotech Gold Key Sponsors
Nanotech Ventures Sponsors
Nanotech Ventures Sponsors
Sponsors
Nanotech Sponsors
News Headlines
NSTI Online Community
 
 

© Nano Science and Technology Institute, all rights reserved.
Terms of use | Privacy policy | Contact