Uniform Nanoparticle based Monolayers Deposited by a Modified Spin Coating Technique
K. Subramanya Mayya, I-S Yeo, U-I Chung and J.T. Moon
Samsung Electronics Co. Ltd., KR
nanoscale materials, nanoparticles, self assembled monolayer, spin coating
A method for deposition of uniform monolayers of cobalt nanoparticles (size ~ 10 nm) with uniformity in the nanoscale upto the macroscale is demonstrated on a 6'' wafer by a modified spin coating method. The deposition method if general and could have applications like single electron transistors, nanoparticle based memory, data storage applications etc.
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Nanotech 2005 Conference Program Abstract